Highlights
Residual stress and texture gradients in protective nickel coatings
The beamline MCX offers a perfect design and geometrical set-up for residual stress and texture analysis by X-ray diffraction. This work presents an example of application of X-ray diffraction to the study of residual stress and texture gradients in electrodeposited Nickel coatings.
Thin films and coatings often show preferred crystalline orientation and a residual stress state as a consequence of the competitive grain growth process taking place during the deposition on the substrate. Moreover, as the film thickness increases and substrate ceases to directly interact with newly formed layers, gradients of preferred orientation and stress can be generated. Residual stress and texture measurements are conveniently performed by means of X-ray diffraction, as the technique is contact-free and non destructive, hence it does not alter the sample during the observation. However, diffraction does not measure stresses directly, but rather strains; to retrieve the former, an appropriate constitutive equation needs to be applied, implying knowledge of the material’s elastic properties and mechanism of grain interaction. The task is made complicated by possible preferred orientation and properties gradients, as well as by the lack of a-priori information on the specific properties of the thin film, which are frequently different from those of the corresponding bulk materials. So far, fairly complex models have been proposed to account for the elastic grain interaction in thin film residual stress analysis, but the agreement with the experimental data, in many cases, is steel poor. An elegant solution consists of performing an in-situ mechanical testing on specimens during X-ray diffraction strain measurement, so to allow a simultaneous determination of residual stress and elastic constants, thus providing a complete outlook of the component’s mechanical properties. |
Thin Film Stress and Texture Analysis at the MCX Synchrotron Radiation Beamline at ELETTRA, M. Ortolani, C.L. Azanza Ricardo, A. Lausi and P. Scardi Materials Science Forum 681, 115-120 (2011) doi 10.4028/www.scientific.net/MSF.681.115 |