Elettra beamlines: main techniques, source and energy range
| Exit | Name | Short description of the main techniques | Source | Energy range [eV] |
|---|---|---|---|---|
| 1.1L | TwinMic | Scanning Transmission X-ray Microscopy, Ptychography, X-ray Fluorescence and Absorption Spectroscopy | id | 400 - 2200 |
| 1.2L | NanoESCA | XPEEM imaging spectroscopy, microprobe ARPES and XPS | id | 25 - 1000 |
| 1.2L | Nanospectroscopy | Spectroscopic photoemission and low energy electron microscope | id | 25 - 1000 |
| 2.2L | ESCA microscopy | Scanning PhotoElectron Microscopy (SPEM) | id | 400 - 1200 |
| 2.2R | SuperESCA | High energy resolution photoemission and X-ray absorption spectroscopy | id | 90 - 1800 |
| 3.2L | Spectromicroscopy | Angle-resolved photoemission microscopy | id | 23; 74 |
| 3.2R | VUV Photoemission | Vacuum UltraViolet Photoemission | id | 20 - 750 |
| 4.2 | CiPo / MOST | Circular Polarization / Molecular Optical Science and Technology (under construction) | id | 7 - 900 |
| 5.2L | SAXS | Small Angle X-ray Scattering | id | 5400; 8000; 16000 |
| 5.2R | XRD1 | X-Ray Diffraction | id | 4000 - 21500 |
| 6.1L | MSB | Materials Science Beamline (for photoemission and X-ray absorption) | bm | 22 - 1000 |
| 6.1R | SYRMEP | SYnchrotron Radiation for MEdical Physics | bm | 9000 - 40000 |
| 6.2R | GasPhase | Gas Phase Photoemission - Photoelectron and fluorescence spectroscopy | id | 13 - 900 |
| 7.1 | MCX | Materials Characterisation by X-ray diffraction | bm | 6000 - 20000 |
| 7.2 | ALOISA | Advanced Line for Overlayer, Interface and Surface Analysis | id | 130 - 1500 |
| 8.1L | BEAR | Bending source for Emission Absorption and Reflectivity | bm | 2.75 - 1600 |
| 8.2 | BACH | Beamline for Advanced diCHroism | id | 44 - 1650 |
| 9.1 | SISSI - Bio | Synchrotron Infrared Source for Spectroscopy and Imaging - Chemical and Life Sciences | bm | 0.001 - 2.5 |
| 9.1 | SISSI - Mat | Synchrotron Infrared Source for Spectroscopy and Imaging - Materials Science | bm | 0.001 - 2.5 |
| 9.2 | APE LE | Advanced Photoelectric Effect experiments (Low Energy) | id | 10 - 100 |
| 9.2 | APE HE | Advanced Photoelectric Effect experiments (High Energy) | id | 200 - 1600 |
| 10.1L | X-ray fluorescence | X-Ray Fluorescence | bm | 700 - 14000 |
| 10.1R | DXRL | Deep X-Ray Lithography | bm | 2 - 20000 |
| 10.2L | IUVS | Inelastic UltraViolet Scattering Beamline | bm | 5 - 11 |
| 10.2R | BaDElPh | Band Dispersion and Electron-Phonon coupling (LE-ARPES) | id | 4.6 - 40 |
| 11.1R | XAFS | X-Ray Absorption Fine Structure | bm | 2400 - 25000 |
| 11.2C | XRD2 | X-Ray Diffraction (Macromolecular Crystallography) | id | 8000 - 35000 |
| 11.2R | Xpress | High pressure X-ray diffraction | bm | 25000 |
Last Updated on Wednesday, 24 July 2024 14:39
