Deep X-ray lithography on “sol–gel” processed noble metal mesoarchitectured films

Noble metal coordination xerogel films (mesostructured with block-copolymers) exhibit solubility switching with increasing X-ray irradiation. Different from other sol–gel systems, these are attributed to film deconstruction under irradiation. These materials can be used as recyclable negative tone resists for deep X-ray lithography that can be further converted into metallic nanoarchi-tectured films.

Fig. (a) Illustration of the lithographic process toward metallic patterns; SEM micrographs of (b) and (c) Ru and (d) and (e) Rh patterns.The corresponding EDX mapping and higher resolution view are reported in the inset (scale bar 50 nm).(f) and (g) Evolution of the extinction coefficient k for Ru and Rh-samples before and after annealing.

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