Interfacial complexation reactions in vacuo: a self-terminating protocol via metal-organic chemical vapor deposition
The engineering of coordination complexes and metal-organic architectures at well-defined interfaces holds great promise in important research areas such as single-site catalysis and molecular magnetism. Here the ability to incorporate metal centers in unique coordination environments can convey specific functionalities to tailor the physical and chemical properties. Usually, such systems are prepared in vacuo by grafting prefabricated metal-organic complexes on surfaces or by co-deposition of molecular linkers and metal adatoms followed by complexation reactions. In the case of transition metals such as W, Ru and Ir, the latter method can be severely limited by the high sublimation temperature of these materials, whereas the former relies on the availability of established organic synthesis protocols. This prompted us to investigate an alternative pathway based on metal-organic chemical vapor deposition, exemplified here by the reaction of porphyrins with a ruthenium carbonyl precursor, Ru3(CO)12, on the Ag(111) surface. Our experiments were based on X-ray photoelectron spectroscopy (XPS) and complementary Near Edge Absorption Fine Structure (NEXAFS) with synchrotron radiation and were performed at the Materials Science Beamline. Additional support was provided by scanning tunneling microscopy (STM) measurements carried out at the Technische Universität München.
Figure 1: Sequential N 1s and Ru 3d5/2 XP spectra and corresponding cartoon of the porphyrin Ru metalation process on Ag(111): (a) Monolayer of the porphyrin on Ag(111). (b) Following exposure to the Ru precursor at 300 K. (c) After annealing to ~550 K. (d) After further exposure and annealing. From A.C. Papageorgiou et al., ACS Nano 7, 4520 (2013) with permission. Copyright 2013 American Chemical Society. . |
This research was conducted by the following research team:
- Anthoula C. Papageorgiou, Francesco Allegretti, Sybille Fischer, Seung Cheol Oh, Özge Sağlam, Joachim Reichert,Alissa Wiengarten, Knud Seufert, Saranyan Vijayaraghavan, David Écija, Willi Auwärter, Katharina Diller, Florian Klappenberger, Johannes V. Barth - Physik Department, Technische Universität München, Garching, Germany.
- Robert G. Acres, Kevin C. Prince, Elettra - Sincrotrone Trieste S.C.p.A., Trieste, Italy.
Contact persons:
Francesco Allegretti, email:
Reference
A. C. Papageorgiou, S. Fischer, S. C. Oh, Ö. Sağlam, J. Reichert, A. Wiengarten, K. Seufert, S. Vijayaraghavan, D. Écija, W. Auwärter, F. Allegretti, R. G. Acres, K. C. Prince, K. Diller, F. Klappenberger, and J. V. Barth "Self terminating protocol for an interfacial complexation reaction in vacuo by metal-organic chemical vapor deposition", ACS Nano 7, 4520 (2013); DOI: 10.1021/nn401171z. |